Arc Ion-Plasma TechnologiesThe Basic features for Arc Ion-Plasma Technologies
At the moment of vacuum arc switching on a contraction on the target surface occurs which leads to forming a “cathode spot”. The spot produces target material vapor ionizing in the electrical field near to the cathode; thus the forming plasma is almost getting ionized and consists of multi charged ions plus a droplet phase of target material; the share of droplet phase is: (i) 10% for fusible and (ii) ~ 1% for refractory metals.
In order to get rid of the droplets special separators are employed.
The Arc Ion-Plasma Technologies are used to deposit the following coatings:
Arc evaporators using for the Arc Ion-Plasma Technologies are of high rate for coatings deposition. The mean current indicator for a single evaporator of various designs fluctuate from 50 to 500 À; the latter shows the prospects for Arc deposition application to meet the requirements for the coatings to be sputtered under high DR.