Arc Ion-Plasma Technologies

The Basic features for Arc Ion-Plasma Technologies

Energy value of an atom evaporating from surface is for: (i) Cd — 50 eV/аt and (ii) W — 850 eV/аt
Mean material output value under Arc is for: (1) Cd — 3х10¹⁸ аt/Cl and (ii) W — 0,2х10¹⁸ аt/Cl
Under mean current of 100 A in a stationary Arc, the deposition rate (DR), for instance, of Ti is 7х10¹⁹ аt/s or 20 gr/h; while if Ti is deposited onto the surface of 1000 сm², the DR can be 50 m /h.

At the moment of vacuum arc switching on a contraction on the target surface occurs which leads to forming a “cathode spot”. The spot produces target material vapor ionizing in the electrical field near to the cathode; thus the forming plasma is almost getting ionized and consists of multi charged ions plus a droplet phase of target material; the share of droplet phase is: (i) 10% for fusible and (ii) ~ 1% for refractory metals.

In order to get rid of the droplets special separators are employed.

The Arc Ion-Plasma Technologies are used to deposit the following coatings:

Wear-resistant for tool and machine industries;
Heat-, corrosion-, erosion resisting for avia GTE and turbines & compressors of power stations;
Bio-compatible for medical purposes;
Decorative

Arc evaporators using for the Arc Ion-Plasma Technologies are of high rate for coatings deposition. The mean current indicator for a single evaporator of various designs fluctuate from 50 to 500 А; the latter shows the prospects for Arc deposition application to meet the requirements for the coatings to be sputtered under high DR.


	About company Coating technology Ion-Plasma Beam Treatment technology Arc Ion-Plasma Technologies High Deposition Rate Magnetron Sputtering Combined & Joint PVD Technologies Ion Beam Assisted Deposition (IBAD) Technology Alternative technologies New materials & coatings Coating equipment Generators for ion-plasma & beams Services Research & Development elaborations Technical papers		Arc Ion-Plasma Technologies The Basic features for Arc Ion-Plasma Technologies Energy value of an atom evaporating from surface is for: (i) Cd — 50 eV/аt and (ii) W — 850 eV/аt Mean material output value under Arc is for: (1) Cd — 3х10¹⁸ аt/Cl and (ii) W — 0,2х10¹⁸ аt/Cl Under mean current of 100 A in a stationary Arc, the deposition rate (DR), for instance, of Ti is 7х10¹⁹ аt/s or 20 gr/h; while if Ti is deposited onto the surface of 1000 сm², the DR can be 50 m /h. At the moment of vacuum arc switching on a contraction on the target surface occurs which leads to forming a “cathode spot”. The spot produces target material vapor ionizing in the electrical field near to the cathode; thus the forming plasma is almost getting ionized and consists of multi charged ions plus a droplet phase of target material; the share of droplet phase is: (i) 10% for fusible and (ii) ~ 1% for refractory metals. In order to get rid of the droplets special separators are employed. The Arc Ion-Plasma Technologies are used to deposit the following coatings: Wear-resistant for tool and machine industries; Heat-, corrosion-, erosion resisting for avia GTE and turbines & compressors of power stations; Bio-compatible for medical purposes; Decorative Arc evaporators using for the Arc Ion-Plasma Technologies are of high rate for coatings deposition. The mean current indicator for a single evaporator of various designs fluctuate from 50 to 500 А; the latter shows the prospects for Arc deposition application to meet the requirements for the coatings to be sputtered under high DR.