Installation for nanostructured coating


1. Purpose
The equipment was designed for scientific research in the area of production and study of film nanostructured materials.

2. Area of application
Solid state physics, physics of metals, materials science, surface engineering in the area for creation of nanomaterials.

3. Technical characteristics of equipment
3.1.Method on obtaining of film nanostructured materials assumes the deposition from plasma on the surface in the vacuum (PVD technology)
3.2. Produced film materials are metals, alloys, intermetallic compounds and carbide, nitrides, oxides, chalcogenides, etc.
3.2.Way to generate plasma is the magnetron charge.
3.3. Number of magnetron plasma generators is minimum 2.
3.4. It is possible to equip this installation with impulse magnetrons.
3.5. Heating and maintenance of preset temperature of the bottom layer (samples) up to 400 ° Ń have been provided through the use of the resistive heater.
3.6. Sample surface may be cleaned by ion beam.
3.7. Bias potential can be directed to the bottom layer (working table with samples) through the use of the system to suppress “micro arches” and frequency commutation.
3.8. Installations may be equipped either with multi position planetary mechanism to move the sprayed samples or with the mechanism to shift the working table upon samples’ position fixation at the place of processing, etc.
3.9. Working volume o the chamber, position of the pumping out devices and electrical physical devices (magnetrons, ion sources and heaters) and also diagnostics gear should be agreed with the Customer. Maximal vacuum created by the system is minimum 10-4 Pa; time required to pump out till the working vacuum is maximum 15 minutes. It is possible to obtain “oil free” vacuum using turbo molecular or cryogen pumps; working chamber is controlled by the Baratron sensor made by «MKS Instruments».
3.10. Number of channels supplying working gases is 3, the accuracy on maintenance of preset flows of working gases and their ratio is 1,0%.
3.11. By the Customer’s wish, the installation may be equipped with the impulse implantor in order to assist the process on materials’ deposition by the beam of the high energy ions. (Cr, Mo, W, Ti, Ta, V, etc.).
3.12. Working process on obtaining of the film material has been automated; it is displayed on the operator’s screen.
3.13. Power supply units were made according to the scheme on reversible converters.
3.14. System of diagnostics allows to control different parameters of the working process including bottom layer temperature, plasma emission characteristics, etc. (upon Customer’s agreement).
4. Main types of produced nanostructured materials:
4.1. Film multilayer materials with nanoscale layers, for example, TiAlN, created by nanolayers with excess of Ti and Al (Photo 1).


Number of layers and their thickness is set by the operator

4.2. Film materials with nanoscale crystallite blocks, for example, composite material Ti-Cr-Cu-B-N, produced by the method on magnetron spraying (Photo 2).
4.3. Film materials with the controlled structure and texture, for example, the same material that was mentioned in Item 4.2, but with the assisting by the ion beam. (Photo 2b).
4.4. Carbide and solid lubricant coating: TiC, TiCN, MoC and others.
4.5. Maximal thickness of coatings reached 20 microns in case the drop phase is absent.
4.6. The area of simultaneously produced coating is minimum 100 cm2.
4.7. Coating irregularity by thickness within this area is maximum 10%.

5. Types of cooperation:
5.1. Equipment is manufactured against the Customer technical specification.
5.2. The Customer’s existing equipment may be retrofitted by modules for resolution of the concrete tasks.
5.3. Delivery of the special cathodes-targets for production of multi component film materials.
5.4. Delivery of technologies on obtaining of nanostructured film materials.