Installation of HDRMSS

Installation of HDRMSS (High Deposition Rate Magnetron Sputtering Systems)

Inacotec has designed an advanced ion-plasma high deposition rate magnetron sputtering systems (HDRMSS) being able to generate a plasma discharge of power density (PD) 40-500 W/сm2 and >; the latter permits under multi cathode scheme (2-8 cathodes) to have a process productivity/deposition rate equaling to 10-100 m /h.
HDRMSS creates an effective coating environment — closed vapor boiler with the circulation of plasma current.
Such a system consists of 2, 3, 4, — 8 and > planar HDR magnetrons
Inside a Chamber just between targets and ionic source a multi-position planetary mechanism with articles/parts to be coated is placed.

Intra-chamber device scheme:

An Installation being equipped with HDRMSS is able to deposit different materials: metals, alloys, chemical compounds, composites, pseudo-alloys. Substrates could be made of: metals, alloys, ceramics, glass, plastics.

HDRMSS Working parameters:

Preliminary Vacuum: P>10^-3 Pa;
Working Vacuum: P=1-0,01 Pa;
Working gas: Ar, P= 1-0,01 Pa;
Reactive Gases: O₂, N₂, C₂H₂, H₂
Start voltage: U = 800-1000 V;
Working voltage: U = 350-700 V;
Power Density: 1-1000 W/cm²;
Deposition distance: > 5 mm.

HDRMSS applications:

To deposit protective functional coatings of 5 — 150 m onto article/parts for machine industries.
To deposit special and new coatings with amorphous and nano-crystal structures including multi-layered and nanostructured.


	About company Coating technology New materials & coatings Coating equipment Installation of HDRMSS Installations of Bulat series Installations of VU-1BS series Installation with carousel transporter Installation with linear transporter Installations of NNV series Generators for ion-plasma & beams Services Research & Development elaborations Technical papers		Installation of HDRMSS Installation of HDRMSS (High Deposition Rate Magnetron Sputtering Systems) Inacotec has designed an advanced ion-plasma high deposition rate magnetron sputtering systems (HDRMSS) being able to generate a plasma discharge of power density (PD) 40-500 W/сm2 and >; the latter permits under multi cathode scheme (2-8 cathodes) to have a process productivity/deposition rate equaling to 10-100 m /h. HDRMSS creates an effective coating environment — closed vapor boiler with the circulation of plasma current. Such a system consists of 2, 3, 4, — 8 and > planar HDR magnetrons Inside a Chamber just between targets and ionic source a multi-position planetary mechanism with articles/parts to be coated is placed. Intra-chamber device scheme: An Installation being equipped with HDRMSS is able to deposit different materials: metals, alloys, chemical compounds, composites, pseudo-alloys. Substrates could be made of: metals, alloys, ceramics, glass, plastics. HDRMSS Working parameters: Preliminary Vacuum: P>10^-3 Pa; Working Vacuum: P=1-0,01 Pa; Working gas: Ar, P= 1-0,01 Pa; Reactive Gases: O₂, N₂, C₂H₂, H₂ Start voltage: U = 800-1000 V; Working voltage: U = 350-700 V; Power Density: 1-1000 W/cm²; Deposition distance: > 5 mm. HDRMSS applications: To deposit protective functional coatings of 5 — 150 m onto article/parts for machine industries. To deposit special and new coatings with amorphous and nano-crystal structures including multi-layered and nanostructured.