Installation for R & D investigations

Installation for R & D investigations designed for MGTY MISIS.

The installation combines a few methods to deposit films. In order to get much higher plasma ionization inside working zone two types of magnetrons — balanced and unbalanced have been mounted and are employed. Such an arrangement alloys more effectively to control the process of films sputtering and having bias potential on substrate.

The photo displays various devices mounted in the chamber:


	About company Coating technology New materials & coatings Coating equipment Generators for ion-plasma & beams Services Research & Development elaborations Installation for R & D investigations Technical papers		Installation for R & D investigations Installation for R & D investigations designed for MGTY MISIS. The installation combines a few methods to deposit films. In order to get much higher plasma ionization inside working zone two types of magnetrons — balanced and unbalanced have been mounted and are employed. Such an arrangement alloys more effectively to control the process of films sputtering and having bias potential on substrate. The photo displays various devices mounted in the chamber: